Application of the vacuum method to obtain graphite

Authors

  • Avliyakulov Khayot Nodirovich Probationer Teacher Bukhara Engineering-Technological Institute
  • Bafoev Bakhrom Botirovich Probationer Teacher Bukhara Engineering-Technological Institute

Keywords:

Thermal spraying, resistive spraying, layered system, defect

Abstract

The article discusses the conceptual requirements for deposition methods widely used in modern microelectronics. The high deposition rate and the atomic energy incident on the substrate during deposition allow these methods to be used to obtain films with various compositions and structures, especially for low temperature epitaxy.

References

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Вакуумное нанесение пленок в квазизамкнутом объеме. М., «Советское радио», 1975, 160 с. Ю. З. Бубнов, М. С. Лурье, Ф. Г. Старос, Г. А. Филаретов.

Технология полупроводниковых приборов и изделий микроэлектроники. В 10 кн.: Учеб. Пособие для ПТУ. Кн. 6. Нанесение пленок в вакууме Минайчев В. Е. – М.: Высш. шк., 1989. – 110 с.: ил.

Карпенко Г. Д., Рубинштейн В. Л. Современные методы генерации осаждаемого вещества при нанесении тонкопленочных покрытий в вакууме. Минск: БелНИИНТИ, 1990 – 36 с.

Костржицкий А. И., Лебединский. Многокомпонентные вакуумные покрытия. –М: «Машиностроение»,1987 – 207 с

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Published

2022-05-22

Issue

Vol. 8 (2022): TJET

Section

Articles

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How to Cite

Application of the vacuum method to obtain graphite. (2022). Texas Journal of Engineering and Technology, 8, 112-114. https://zienjournals.com/index.php/tjet/article/view/1713