Effect Of The Pressure On The Properties Of OxygenContaining Silicon Single Crystals

Authors

  • Abdumajid Turaev Center for the Development of Nanotechnology at the National University of Uzbekistan named after Mirzo Ulugbek
  • G‘anijon Raxmonov Center for the Development of Nanotechnology at the National University of Uzbekistan named after Mirzo Ulugbek
  • Azim Soatov Center for the Development of Nanotechnology at the National University of Uzbekistan named after Mirzo Ulugbek
  • Omadbek Rayimjonov Center for the Development of Nanotechnology at the National University of Uzbekistan named after Mirzo Ulugbek
  • Rasul Burxanov Center for the Development of Nanotechnology at the National University of Uzbekistan named after Mirzo Ulugbek
  • Noiba Batirova National University of Uzbekistan named after Mirzo Ulugbek

DOI:

https://doi.org/10.62480/tjms.2025.vol47.6376.pp40-45

Keywords:

silicon, oxygen

Abstract

It is known[1] that in silicon single crystals grown by the Czochralski method, the oxygen content can be controlled within (2 - 8) ×1017 cm-3 . In crystals grown by the FZ method (the crucible-less floating zone technique or "floating zone” method), both in vacuum and in the inert gas atmosphere, the oxygen content is less than 3×1016 cm-3 . Hence, it is clear why the properties of silicon with oxygen content in the range 3 × 1016 - 2 ×1017 cm-3 are least studied.

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Published

2025-08-29

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Section

Articles

How to Cite

Effect Of The Pressure On The Properties Of OxygenContaining Silicon Single Crystals. (2025). Texas Journal of Multidisciplinary Studies, 47, 40-45. https://doi.org/10.62480/tjms.2025.vol47.6376.pp40-45